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ALD and PEALD deposition of HfO2 and its effects on the nature of oxygen vacancies - ScienceDirect
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Atomic Layer Deposition (ALD) Journal, News and Community
Plasma-Enhanced Atomic Layer Deposition of HfO2 on Monolayer, Bilayer, and Trilayer MoS2 for the Integration of High-κ Dielectrics in Two-Dimensional Devices | ACS Applied Nano Materials
Schematic of ALD-growth process [reproduced with permission (Kim et... | Download Scientific Diagram
Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O3 reactants - Dalton Transactions (RSC Publishing)
Thickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistors | Scientific Reports
Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2 | The Journal of Physical Chemistry C
Atomic Layer Deposition | Modern Magnetic Systems - Max Planck Institute for Intelligent Systems
Table I from Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma | Semantic Scholar
Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition | The Journal of Physical Chemistry C
Things You Should Know about Atomic Layer Deposition (ALD)
HfO2/SiO2 anti-reflection films for UV lasers via plasma-enhanced atomic layer deposition - ScienceDirect
Figure 1 from Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma | Semantic Scholar
Atomic layer deposition of HfO2, Al2O3, and HfAlOx using O3 and metal(diethylamino) precursors | Journal of Materials Research | Cambridge Core
Hafnium (IV) oxide obtained by atomic layer deposition (ALD) technology promotes early osteogenesis via activation of Runx2-OPN-mir21A axis while inhibits osteoclasts activity | Journal of Nanobiotechnology | Full Text
Importance of precursor delivery mechanism for Tetra-kis-ethylmethylaminohafnium/water atomic layer deposition process - ScienceDirect
Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability - Journal of Materials Chemistry (RSC Publishing)
PEALD of HfO2 Thin Films: Precursor Tuning and a New Near-Ambient-Pressure XPS Approach to in Situ Examination of Thin-Film Surfaces Exposed to Reactive Gases | ACS Applied Materials & Interfaces
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry | Scientific Reports
Atomic layer deposited HfO2 and HfO2/TiO2 bi-layer films using a heteroleptic Hf-precursor for logic and memory applications - Journal of Materials Chemistry (RSC Publishing)
Direct atomic layer deposition of ultra-thin Al2O3 and HfO2 films on gold-supported monolayer MoS2 - ScienceDirect
Atomic Layer Deposition for Graphene Device Integration - Vervuurt - 2017 - Advanced Materials Interfaces - Wiley Online Library
Schematic representation of a surface using plasma-enhanced atomic... | Download Scientific Diagram
Process schematics for PVD and ALD of ferroelectric HfO 2 in TiN/HfO 2... | Download Scientific Diagram
